Controlled Sequence Photoresists from Polypeptoids

Low stochastics, high sensitivity photoresists remain a goal for lithography. Here we present study of polymer system, polypeptoids, using synthetic strategy borrowed from the biomedical community to make improvements these resist characteristics through control sequence. We describe peptoid polymers that possess identical molecular size, composition and sequence with higher uniformity than possible by conventional techniques. report results exposure materials DUV radiation chemical changes occur. In addition, highlight unexpected observations role on lithographic performance.